Precursors & Chemicals
AsiaGas delivers a comprehensive portfolio of precursors and specialty chemicals for CVD/ALD deposition, wafer cleaning, etching, and surface preparation. Designed for semiconductor, display, and electronics manufacturing, our materials are backed by scalable capacity, flexible packaging, and strict quality standards.
We know that process materials directly influence yield, reliability, and device performance. That’s why our solutions combine:
- Quality assurance & full traceability
- Reliable logistics and scalable supply
- Responsive technical support from lab to fab
Precursors for CVD/ALD
We supply a wide range of silicon-based (Si) and metal-organic (MO) precursors for thin-film deposition processes such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).
Each precursor is supported by proven field performance, scalable capacity, and rigorous quality control trusted by leading global manufacturers.
Si Series
HCDS
CI3SISiCI3
Hexachloro disilane
TEOS
Si(OEt)4
Tetraethyl orthosilicate
TSA
(SiH3)3N
Trisilylamine
BDEAS
(Et2N)2SiH2
Bis diethylamino silane
BTBAS
(tBu2N)2SiH2
Bis t-Butylamino silane
3DMASi
SiH(NMe2)3
Tris dimethylamino Silane
DIPAS
C6H17NSi
Diisopropylamino silane
4MS
(CH3)4Si
Tetramethylsilane
MO Series
TDMAT
[(CH3)2N]4Ti
Tetrakis dimethylamido titanium IV
TiCl4
TiCI4
Titanium chloride
TEMAHf
Hf(NEtMe)4
Hafnium tetrakis ethy methylamido
TEMAZr
Zr(NCH3C2H5)4
Tetrakis ethy|methylamido zirconium IV
TMA
Al(CH3)3
Aluminium trimethy
PDMAT:
C10H30N5Ta
Pentakis dimethylamino tantalum V
ССТВА
C12H10Co206
3,3-Dimethyl-1-butyne dicobalt hexacarbonyl
CpCo(CO)2
C5H5Co(CO)2
Dicarbonylcyclopentadienyl cobalt I
Specialty Chemicals for Semiconductor & Electronics
AsiaGas provides a broad portfolio of electronic-grade and specialty chemicals that support water cleaning, etching, surface treatment, and device fabrication. Each chemical is carefully sourced, packaged, and tested to meet the most stringent industry specifications.
